Fine ceramics (advanced ceramics, advanced technical ceramics) — Test method for plasma resistance of ceramic components in semiconductor manufacturing equipment

This document specifies a test method for plasma resistance of ceramic components in semiconductor manufacturing equipment. It is applicable to ceramic components of plasma-resistant components in dry etching chambers used in semiconductor manufacturing.

Céramiques techniques — Méthode d’essai pour déterminer la résistance au plasma des composants céramiques dans les équipements de production à semi-conducteurs

General Information

Status
Published
Publication Date
17-Jun-2019
Current Stage
6060 - International Standard published
Start Date
13-Oct-2019
Due Date
14-Oct-2019
Completion Date
18-Jun-2019
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ISO 21859:2019 - Fine ceramics (advanced ceramics, advanced technical ceramics) -- Test method for plasma resistance of ceramic components in semiconductor manufacturing equipment
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INTERNATIONAL ISO
STANDARD 21859
First edition
2019-06
Fine ceramics (advanced ceramics,
advanced technical ceramics) — Test
method for plasma resistance of
ceramic components in semiconductor
manufacturing equipment
Céramiques techniques — Méthode d’essai pour déterminer
la résistance au plasma des composants céramiques dans les
équipements de production à semi-conducteurs
Reference number
ISO 21859:2019(E)
©
ISO 2019

---------------------- Page: 1 ----------------------
ISO 21859:2019(E)

COPYRIGHT PROTECTED DOCUMENT
© ISO 2019
All rights reserved. Unless otherwise specified, or required in the context of its implementation, no part of this publication may
be reproduced or utilized otherwise in any form or by any means, electronic or mechanical, including photocopying, or posting
on the internet or an intranet, without prior written permission. Permission can be requested from either ISO at the address
below or ISO’s member body in the country of the requester.
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Published in Switzerland
ii © ISO 2019 – All rights reserved

---------------------- Page: 2 ----------------------
ISO 21859:2019(E)

Contents Page
Foreword .iv
1 Scope . 1
2 Normative references . 1
3 Terms and definitions . 1
4 Principle of measurement . 1
5 Test environment . 2
6 Apparatus . 2
7 Test pieces . 2
7.1 General consideration . 2
7.2 Surface conditions . 2
8 Procedure. 2
8.1 Measurement of surface roughness before a plasma resistance test . 2
8.2 Masking . 3
8.3 Plasma resistance test . 3
8.3.1 Setting of test pieces . 3
8.3.2 Test conditions. 3
8.4 Measurement of erosion depth . 3
8.5 Measurement of surface roughness after the plasma resistance test . 3
9 Calculation . 3
9.1 Calculation of mean erosion depth . 3
9.2 Calculation of surface roughness . 4
10 Test report . 4
© ISO 2019 – All rights reserved iii

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ISO 21859:2019(E)

Foreword
ISO (the International Organization for Standardization) is a worldwide federation of national standards
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electrotechnical standardization.
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described in the ISO/IEC Directives, Part 1. In particular, the different approval criteria needed for the
different types of ISO documents should be noted. This document was drafted in accordance with the
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This document was prepared by Technical Committee ISO/TC 206, Fine ceramics.
Any feedback or questions on this document should be directed to the user’s national standards body. A
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iv © ISO 2019 – All rights reserved

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